Hidrojenlendirilmiş Amorf Silisyum Tabanlı Yansıtmaz Kaplamaların Üretilmesi ve Optik Özelliklerinin İncelenmesi

Abstract

a-SiOx:H and a-SiNx:H single layer and double layer with the structure of a-SiOx:H and a-SiNx:H, anti reflection coatings (SLARC and DLARC) were designed and depostied in a plasma enhanced chemical vapor deposition (PECVD) system on single crystlaline and glass substrates. a-SiOx:H and a-SiNx:H layers were deposited, by using the flow rates 2 sccm of SiH4 and 8 sccm of CO2 and 8 sccm N2, respectively. Thicknesses of the samples were calibrated as a funciton of deposition time. By using the calibration functions, the required durations of experiments to design anti reflecting layers were extrapolated.With the SLARC design of a-SiOx:H, optical reflectivity from glass was measured as 0.087 at 512 nm and on crystalline silicon as 0.094 at 542 nm. The reflectivity of a-SiNx:H on glass was measured as 0.095 at 542 nm and as 0.0085 as 520 nm on silicon. With the DLARC design of a-SiOx:H a-SiNx:H structure, the reflectivity was mesured as 0.036 at 528 nm on glass and as 0.0084 at 548 nm on silicon.