Reaktif Rf Magnetron Kopartma Yöntemi Kullanılarak Hazırlanan Wo3 İnce Filmlerin Optik, Yapısal ve Elektrokromik Özelliklerinin İncelenmesi

Abstract

In this master of thesis study, WO3 thin films were prepared by reactive RF magnetron sputtering method and the effects of the film deposition parameters on the optical, structural and electrochromic properties of the films were investigated. Thin film properties depend on the deposition parameters such as total pressure, oxygen partial pressure and substrate temperature etc. It is possible to change the optical, structural and electrochromic properties of the films by controlling the deposition parameters. The effect of total pressure on the film properties was investigated. For this purpose, the argon gas was introduced in to the chamber in the range of 5 – 40 mTorr while the oxygen partial pressure maintained constant during the deposition process. The optical transmissions of all the films are quite high. The sample prepared at 20 mTorr argon gas with 10% of oxygen partial pressure is the most colored one with the highest coloration efficiency of 17.46 cm2 C.