dc.contributor.author | Rüzgar, K. | |
dc.contributor.author | Bacıoğlu, A. | |
dc.date.accessioned | 2021-06-03T09:14:57Z | |
dc.date.available | 2021-06-03T09:14:57Z | |
dc.date.issued | 2019 | |
dc.identifier.issn | 01679317 (ISSN) | |
dc.identifier.uri | http://dx.doi.org/10.1016/j.mee.2019.110995 | |
dc.identifier.uri | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85066821575&doi=10.1016%2fj.mee.2019.110995&partnerID=40&md5=ec4581ed875736c5b7b62d519690a30e | |
dc.identifier.uri | http://hdl.handle.net/11655/24421 | |
dc.description.abstract | The authors regret the mistake in our publication title. The word “sireve” in the title is actually “sieve”. Incorrect title: Process optimization of parameterized single shot method for a rapid production of photon sireve with direct write lithography. Correct title: Process optimization of parameterized single shot method for a rapid production of photon sieve with direct write lithography. The authors would like to apologise for any inconvenience caused. © 2019 Elsevier B.V. | |
dc.language.iso | en | |
dc.relation.isversionof | 10.1016/j.mee.2019.110995 | |
dc.rights | Attribution 4.0 United States | |
dc.rights | info:eu-repo/semantics/openAccess | |
dc.rights.uri | https://creativecommons.org/licenses/by/4.0/ | |
dc.title | Corrigendum To “Process Optimization Of Parameterized Single Shot Method For A Rapid Production Of Photon Sireve With Direct Write Lithography” Microelectronic Engineering, Volume 209, 15 March 2019, Pages 41–48 (Microelectronic Engineering (2019) 209 (41–48), (S0167931719300607), (10.1016/J.Mee.2019.03.014)) | |
dc.type | info:eu-repo/semantics/article | |
dc.type | info:eu-repo/semantics/publishedVersion | |
dc.relation.journal | Microelectronic Engineering | |
dc.contributor.department | Fizik Mühendisliği | |
dc.identifier.volume | 215 | |
dc.description.index | Scopus | |