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dc.contributor.authorRüzgar, K.
dc.contributor.authorBacıoğlu, A.
dc.date.accessioned2021-06-03T09:14:57Z
dc.date.available2021-06-03T09:14:57Z
dc.date.issued2019
dc.identifier.issn01679317 (ISSN)
dc.identifier.urihttp://dx.doi.org/10.1016/j.mee.2019.110995
dc.identifier.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85066821575&doi=10.1016%2fj.mee.2019.110995&partnerID=40&md5=ec4581ed875736c5b7b62d519690a30e
dc.identifier.urihttp://hdl.handle.net/11655/24421
dc.description.abstractThe authors regret the mistake in our publication title. The word “sireve” in the title is actually “sieve”. Incorrect title: Process optimization of parameterized single shot method for a rapid production of photon sireve with direct write lithography. Correct title: Process optimization of parameterized single shot method for a rapid production of photon sieve with direct write lithography. The authors would like to apologise for any inconvenience caused. © 2019 Elsevier B.V.
dc.language.isoen
dc.relation.isversionof10.1016/j.mee.2019.110995
dc.rightsAttribution 4.0 United States
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.titleCorrigendum To “Process Optimization Of Parameterized Single Shot Method For A Rapid Production Of Photon Sireve With Direct Write Lithography” Microelectronic Engineering, Volume 209, 15 March 2019, Pages 41–48 (Microelectronic Engineering (2019) 209 (41–48), (S0167931719300607), (10.1016/J.Mee.2019.03.014))
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion
dc.relation.journalMicroelectronic Engineering
dc.contributor.departmentFizik Mühendisliği
dc.identifier.volume215
dc.description.indexScopus


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