Corrigendum To “Process Optimization Of Parameterized Single Shot Method For A Rapid Production Of Photon Sireve With Direct Write Lithography” Microelectronic Engineering, Volume 209, 15 March 2019, Pages 41–48 (Microelectronic Engineering (2019) 209 (41–48), (S0167931719300607), (10.1016/J.Mee.2019.03.014))

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2019Author
Rüzgar, K.
Bacıoğlu, A.
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The authors regret the mistake in our publication title. The word “sireve” in the title is actually “sieve”. Incorrect title: Process optimization of parameterized single shot method for a rapid production of photon sireve with direct write lithography. Correct title: Process optimization of parameterized single shot method for a rapid production of photon sieve with direct write lithography. The authors would like to apologise for any inconvenience caused. © 2019 Elsevier B.V.
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http://dx.doi.org/10.1016/j.mee.2019.110995https://www.scopus.com/inward/record.uri?eid=2-s2.0-85066821575&doi=10.1016%2fj.mee.2019.110995&partnerID=40&md5=ec4581ed875736c5b7b62d519690a30e
http://hdl.handle.net/11655/24421