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Process Optimization Of Parameterized Single Shot Method For A Rapid Production Of Photon Sireve With Direct Write Lithography (Vol 209, Pg 41, 2019)Y

dc.contributor.authorRuzgar, Kemal
dc.contributor.authorBacioglu, Akin
dc.date.accessioned2021-06-03T09:15:09Z
dc.date.available2021-06-03T09:15:09Z
dc.date.issued2019
dc.identifier.issn0167-9317
dc.identifier.urihttp://dx.doi.org/10.1016/j.mee.2019.110995
dc.identifier.urihttp://hdl.handle.net/11655/24482
dc.language.isoen
dc.relation.isversionof10.1016/j.mee.2019.110995
dc.rightsAttribution 4.0 United States
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.titleProcess Optimization Of Parameterized Single Shot Method For A Rapid Production Of Photon Sireve With Direct Write Lithography (Vol 209, Pg 41, 2019)Y
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion
dc.relation.journalMicroelectronic Engineering
dc.contributor.departmentFizik Mühendisliği
dc.identifier.volume215
dc.description.indexWoS


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Except where otherwise noted, this item's license is described as Attribution 4.0 United States